Сarbon film obtained by ion-plasma sputtering

Authors

  • M.Zh. Buranbaev Al-Farabi Kazakh National University, Kazakstan, Almaty
  • Zh.A. Entibekov Al-Farabi Kazakh National University, Kazakstan, Almaty
  • O.E. Kaipoldayev Al-Farabi Kazakh National University, Kazakstan, Almaty
  • A.M. Derbissalin Al-Farabi Kazakh National University, Kazakstan, Almaty

Keywords:

amorphous semiconductor films, ion-plasma carbon films sputter, silicon substrate, phase composition

Abstract

By ion-plasma sputtering, carbon films were obtained. We consider the phase composition, internal structure, surface morphology, measured the thickness of the films

Downloads

Published

2012-03-25

Issue

Vol. 2012 No. 1 (2012): KazNU Bulletin. Physics series

Section

Condensed Matter Physics and Materials Science Problems. NanoScience

How to Cite

Сarbon film obtained by ion-plasma sputtering. (2012). Recent Contributions to Physics, 2012(1), 12-15. https://bph.kaznu.kz/index.php/zhuzhu/article/view/672

Most read articles by the same author(s)