Myrzabekova M.М.; GUSEINOV, N.R.; ZAITSEV, S.I.; SHABELNIKOVA, Ya.L.; MURATOV, M.M.; MURADOVA, S.R.; TURARBAEVA, T.B. Study of the electron lithography parameters by AFM. Recent Contributions to Physics, [S. l.], v. 2019, n. 1, p. 81–90, 2019. DOI: 10.26577/rcph-2019-1-1112. Disponível em: https://bph.kaznu.kz/index.php/zhuzhu/article/view/1112. Acesso em: 5 jul. 2026.