Effect of three-minute hydrogen plasma treatment on the structure and properties of SnO2 thin films

  • N.M. Tompakova Satpayev University, Institute of Physics and Technology, Almaty, Kazakhstan
  • E.A. Dmitriyeva Satpayev University, Institute of Physics and Technology, Almaty, Kazakhstan
  • E.A. Grushevskaya Satpayev University, Institute of Physics and Technology, Almaty, Kazakhstan
  • I.A. Lebedev Satpayev University, Institute of Physics and Technology, Almaty, Kazakhstan
  • A.S. Serikkanov Satpayev University, Institute of Physics and Technology, Almaty, Kazakhstan
  • D.M. Mukhamedshina Satpayev University, Institute of Physics and Technology, Almaty, Kazakhstan
  • K.A. Mit’ Satpayev University, Institute of Physics and Technology, Almaty, Kazakhstan

Abstract

Thin films of tin dioxide were obtained from five-water tin tetrachloride by dissolution in 97% ethanol. The concentration of tin ions in the film-forming solution was 0.12 mol/l, 0.16 mol/l, 0.2 mol/l. The film-forming solution SnCl4/EtOH was applied to the surface of glass substrates by a modified dipping method. Substrates were dried in the air and then annealed at 400°C. Just 4 layers were applied. Hydrogen plasma treatment was carried out at a pressure of 6.5 Pa, power of 20 Watts, oscillation frequency generated by the equipment 27.12 MHz ±0.6%. The decrease of transparency, within the limits of accuracy of measurement of the films obtained from film-forming system with a concentration of tin ions of 0.12 mol/l and 0.2 mol/l were observed. The transparency of the films obtained from film-forming systems with tin ion concentration 0.16 mol/l decreased by 3%. The resistance of the films decreased by 1.5 times. X-ray diffraction analysis showed an increase in the intensity of diffraction peaks from the planes of SnO2 crystallites. An important technical result was obtained: a decrease in the resistance of SnO2 thin films without a significant decrease in transparency, using a film-forming solution with a tin ion concentration of 0.12 mol/l and 0.2 mol/l after treatment for 3 minutes in hydrogen plasma.

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Published
2019-12-21
How to Cite
TOMPAKOVA, N.M. et al. Effect of three-minute hydrogen plasma treatment on the structure and properties of SnO2 thin films. Recent Contributions to Physics (Rec.Contr.Phys.), [S.l.], v. 71, n. 4, p. 67-74, dec. 2019. ISSN 2663-2276. Available at: <https://bph.kaznu.kz/index.php/zhuzhu/article/view/1216>. Date accessed: 31 oct. 2020. doi: https://doi.org/10.26577/RCPh-2019-i4-9.
Section
Condensed Matter Physics and Materials Science Problems. NanoScience

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