Principles for the development of vacuum systems for plasma applications

Authors

  • A. Zhukeshov IETP, Al-Farabi Kazakh National University, Kazakhstan, Almaty
  • A. Gabdullina IETP, Al-Farabi Kazakh National University, Kazakhstan, Almaty
  • S. Pak IETP, Al-Farabi Kazakh National University, Kazakhstan, Almaty
  • A. Amrenova IETP, Al-Farabi Kazakh National University, Kazakhstan, Almaty
  • A. Kaibar IETP, Al-Farabi Kazakh National University, Kazakhstan, Almaty
  • S. Кulzhanova Al-Farabi Kazakh National University, Kazakstan, Almaty
  • K. Kurmanbaev IETP, Al-Farabi Kazakh National University, Kazakhstan, Almaty
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Keywords:

Plasma technology, method of vacuum evaporation, vacuum unit

Abstract

This article contains basic principles for the development of vacuum systems for use in plasma processes. Outlines the advantages of pulse plasma treatment and methods of vacuum plasma spraying. Explains the basic principles of automation
and vacuum switch.

References

1 A. Zhukeshov, Journal of Physics. Conference series, 63, 012014 (2007).

2 A.I. Morozov Vvedeniye v plazmodinamiku, (Moscow, Fizmatlit, 2006), 560 s. (in Russ)

3 B.M. Ibraev, Journal of Engeneering Thermophysics, 12, 183-190 (2003).

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Published

2018-09-05

Issue

Vol. 40 No. 1 (2012): KazNU Bulletin. Physics series

Section

Plasma Physics

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