Calculation of technological parameters of deposition process of carbon films on copper buffer layer
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Keywords:
carbon films, buffer layer, sputtering coefficient, sputtering rate, evaporation rate.Abstract
In work calculations results of analytical dependences of technological parameters of deposition process of carbon films on copper buffer layer are presented, which allow to predict optimal concentration of hydrogen in a gas mix, intervals of working tension target-anode, thickness of deposited films and respectively time of experiments.References
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Published
2013-09-27
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Condensed Matter Physics and Materials Science Problems. NanoScience
