Antireflection сoatings for silicon solar cells formed by wet chemistry methods

Abstract

The results of theoretical and experimental investigations of nanostructured silicon-based layers of different morphology and consideration of their application as antireflection coatings for silicon solar cells are presented. Nanostructured silicon layers were obtained by three wet chemistry methods: (1) electrochemical etching in hydrofluoric acid solutions (porous silicon formation); (2) electrochemical stain etching in hydrofluoric and nitric acids and (3) metal-assisted chemical etching. The obtained porous layers exhibit optical properties of semiconductor nanostructures with sizes in the range from 1 up to 100 nm. The minimal total reflection coefficient below 1% in the spectral range from 400 to 1100 nm was obtained for the coatings based on Si layers formed by metal-assisted chemical etching