Influence of technological parameters of obtaining carbon film nanostructures

Authors

  • I.A. Tsyganov Al-Farabi Kazakh National University, Kazakstan, Almaty
  • N.R. Guseinov National Nanolaboratory of Open Type, Al-Farabi KazNU, Almaty, Kazakhstan
  • A.S. Kozhantaeva Al-Farabi Kazakh National University, Kazakstan, Almaty
  • N.N. Uzakbaeva Al-Farabi Kazakh National University, Kazakstan, Almaty
  • A.N. Shadiyarbekova Al-Farabi Kazakh National University, Kazakstan, Almaty
  • A.A. Erbolaev Al-Farabi Kazakh National University, Kazakstan, Almaty
  • A.S. Isaev Al-Farabi Kazakh National University, Kazakstan, Almaty
  • M.M. Zhumagulov Al-Farabi Kazakh National University, Kazakstan, Almaty
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Keywords:

carbon film nanostructures, nanodiamonds, magnetron sputtering, Raman spectroscopy, scanning electron microscopy

Abstract

The influence of technological parameters of film carbon nanostructures obtained on metallic and semiconductor substrates by the method of magnetron ion-plasma sputtering is considered. The results on the effect of a mixture of gases Ar+H2 and Ar+CH4 on the structure of films that have been investigated using scanning electron microscopy and Raman spectroscopy are presented. According to the Raman spectra data presented in the article, the features of the structure of the obtained samples are described, which differ greatly depending on the gas mixture used. From the results of SEM microphotographs, the distribution and average sizes of the detected nano-sized carbon fragments were estimated. The analyzed data reflect the properties of carbon film nanostructures depending on the technological parameters and the conditions for preparation of targets. The temperature patterns and the dependence of the working gas mixture used are determined.

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Published

2018-03-24

Issue

Vol. 64 No. 1 (2018): Recent Contribution to Physics

Section

Condensed Matter Physics and Materials Science Problems. NanoScience

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